Polysilicon hard mask for enhanced alignment signal

Details Polysilicon hard mask for enhanced alignment signal Polysilicon hard mask for enhanced alignment signal

2006-05-10

2009-06-16

Nguyen, Dao H (Department: 2818)

Semiconductor device manufacturing: process

Formation of electrically isolated lateral semiconductive...

Having substrate registration feature

C438S462000, C438S682000, C438S975000, C257S431000, C257S464000, C257S797000, C257SE21165, C257SE21438

Reexamination Certificate

active

07547608

ABSTRACT:
A method is provided for forming a polysilicon layer on a substrate and aligning an exposure system with an alignment feature of the substrate through the polysilicon layer. In such method, a polysilicon layer is deposited over the substrate having the alignment feature such that the polysilicon layer reaches a first temperature. The polysilicon layer is then annealed with the substrate to raise the polysilicon layer to a second temperature higher than the first temperature. A photoimageable layer is then deposited over the polysilicon layer, after which an alignment signal including light from the alignment feature is received through the annealed polysilicon layer. Using the alignment signal passing through the annealed polysilicon layer from the alignment feature, an exposure system is aligned with the substrate with improved results.

REFERENCES:
patent: 6027861 (2000-02-01), Yu et al.
patent: 6287951 (2001-09-01), Lucas et al.
patent: 6696365 (2004-02-01), Kumar et al.
patent: 6719808 (2004-04-01), Kim et al.
patent: 6764903 (2004-07-01), Chan et al.
patent: 6790374 (2004-09-01), Ho et al.
patent: 2005/0012228 (2005-01-01), Hiramatsu et al.
patent: 2007/0029614 (2007-02-01), Shiota et al.
patent: 2001176841 (2004-04-01), None

Affiliated with

Also associated with

Rating

Polysilicon hard mask for enhanced alignment signal does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polysilicon hard mask for enhanced alignment signal, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polysilicon hard mask for enhanced alignment signal will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4144599