Polysilicon and silicon dioxide light scatterers for silicon...

Details Polysilicon and silicon dioxide light scatterers for silicon... Polysilicon and silicon dioxide light scatterers for silicon...

2006-01-31

2006-01-31

Font, Frank G. (Department: 2883)

Optical waveguides

Planar optical waveguide

Thin film optical waveguide

C385S129000

Reexamination Certificate

active

06993236

ABSTRACT:
A standard CMOS process is used to fabricate optical, optoelectronic and electronic devices at the same time on a monolithic integrated circuit. FIG.6shows a polysilicon and silicon dioxide light scattering element formed on a silicon waveguide. The polysilicon light scatterer is formed on the core of the waveguide with a silicon dioxide layer between the polysilicon and the core. A standard CMOS process is used to form the waveguide and the light scattering element. FIG.6A is a table summarizing the elements of the light scatterer and the waveguide of FIG.6and the CMOS transistors of FIGS.1and2, which are formed from the same materials at the same time on the same substrate. Forming multiple light scatterers on the core of a waveguide can make a grating coupler.

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