Polysilazane precursors for silicon nitride and resultant produc

Details Polysilazane precursors for silicon nitride and resultant produc Polysilazane precursors for silicon nitride and resultant produc

1991-09-24

1994-03-15

Breneman, R. Bruce

Chemistry of inorganic compounds

Silicon or compound thereof

423344, 501 97, C01B 3304

Patent

active

052944255

ABSTRACT:
A method of making a polysilazane comprising forming a reaction medium comprising at least one halomonosilane, an ammonium compound, and an organic solvent for said at least one halomonosilane, carrying out the reaction between said at least one halomonosilane and said ammonium compound in the absence of any catalyst, oxygen, and moisture at atmospheric pressure and at a temperature of about -80.degree. C. to 50.degree. C. for a time sufficient to form said polysilazane, and separating said polysilazane from said reaction medium.

REFERENCES:
patent: 4395460 (1983-07-01), Gaul
patent: 4397828 (1983-08-01), Seyferth et al.
patent: 4840778 (1989-06-01), Arai et al.
patent: 4983552 (1991-01-01), Gallo
patent: 5084423 (1992-01-01), Vaahs et al.

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