Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1988-05-13
1989-10-03
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430272, 430270, 430197, 525474, 528 10, 528 14, 528 26, 556411, 556465, 556467, 556430, G03C 152
Patent
active
048716464
ABSTRACT:
Disclosed are a polysilane containing a unit represented by the following formulas I, II, or III, and a photosensitive composition consisting of the polysilane. ##STR1##
REFERENCES:
patent: 3338869 (1967-08-01), Haluska
patent: 4126527 (1978-11-01), Kaufman
patent: 4260780 (1981-04-01), West
patent: 4569953 (1986-02-01), West et al.
patent: 4709054 (1987-11-01), Rich
patent: 4745169 (1988-05-01), Sugiyama et al.
patent: 4788127 (1988-11-01), Bailey et al.
patent: 4822716 (1989-04-01), Onishi et al.
Journal of Polymer Science: Polymer Letters Ed., vol. 21, pp. 819-822, (1983).
Hayase Shizu
Horiguchi Rumiko
Onishi Yasunobu
Ushirogouchi Toru
Kabushiki Kaisha Toshiba
Michl Paul R.
RoDee C. D.
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