Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From silicon reactant having at least one...
Reexamination Certificate
2005-10-06
2009-02-03
Gulakowski, Randy (Department: 1796)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From silicon reactant having at least one...
C528S031000, C528S033000, C556S430000, C556S487000
Reexamination Certificate
active
07485691
ABSTRACT:
Polysilanes, inks containing the same, and methods for their preparation are disclosed. The polysilane generally has the formula H—[(AHR)n(c-AmHpm−2)q]—H, where each instance of A is independently Si or Ge; R is H, —AaHa+1Ra, halogen, aryl or substituted aryl; (n+a)≧10 if q=0, q≧3 if n=0, and (n+q)≧6 if both n and q≠0; p is 1 or 2; and m is from 3 to 12. In one aspect, the method generally includes the steps of combining a silane compound of the formula AHaR14−a, the formula AkHgR1′hand/or the formula c-AmHpmR1rmwith a catalyst of the formula R4xR5yMXz(or an immobilized derivative thereof) to form a poly(aryl)silane; then washing the poly(aryl)silane with an aqueous washing composition and contacting the poly(aryl)silane with an adsorbent to remove the metal M. In another aspect, the method includes the steps of halogenating a polyarylsilane to form a halopolysilane; and reducing the halopolysilane with a metal hydride to form the polysilane. The synthesis of semiconductor inks via dehydrocoupling of silanes and/or germanes allows for tuning of the ink properties (e.g., viscosity, boiling point, and surface tension) and for deposition of silicon films or islands by spincoating, inkjetting, dropcasting, etc., with or without the use of UV irradiation.
REFERENCES:
patent: 4052430 (1977-10-01), Yajima et al.
patent: 4276424 (1981-06-01), Peterson, Jr. et al.
patent: 4310482 (1982-01-01), Baney
patent: 4537942 (1985-08-01), Brown-Wensley et al.
patent: 4554180 (1985-11-01), Hirooka
patent: 4611035 (1986-09-01), Brown-Wensley et al.
patent: 4683145 (1987-07-01), Nishimura et al.
patent: 4683146 (1987-07-01), Hirai et al.
patent: 4704444 (1987-11-01), Brown-Wensley et al.
patent: 4726963 (1988-02-01), Ishihara et al.
patent: 4759947 (1988-07-01), Ishihara et al.
patent: 4820788 (1989-04-01), Zeigler
patent: 4822703 (1989-04-01), Badesha et al.
patent: 4830890 (1989-05-01), Kanai
patent: 4835005 (1989-05-01), Hirooka et al.
patent: 4841083 (1989-06-01), Nagai et al.
patent: 4992520 (1991-02-01), Zeigler
patent: 5153295 (1992-10-01), Whitmarsh et al.
patent: 5204380 (1993-04-01), Seyferth et al.
patent: 5358987 (1994-10-01), Kanai et al.
patent: 5700400 (1997-12-01), Ikai et al.
patent: 5798428 (1998-08-01), Schwab et al.
patent: 5866471 (1999-02-01), Beppu et al.
patent: 5942637 (1999-08-01), Boudjouk et al.
patent: 6005036 (1999-12-01), Carrozza et al.
patent: 6140448 (2000-10-01), Choi et al.
patent: 6174982 (2001-01-01), Nishida et al.
patent: 6503570 (2003-01-01), Matsuki et al.
patent: 6514801 (2003-02-01), Yudasaka et al.
patent: 6517911 (2003-02-01), Matsuki
patent: 6518087 (2003-02-01), Furusawa et al.
patent: 6527847 (2003-03-01), Matsuki
patent: 6541354 (2003-04-01), Shimoda et al.
patent: 6610872 (2003-08-01), Choi et al.
patent: 6767775 (2004-07-01), Yudasaka et al.
patent: 6884700 (2005-04-01), Aoki et al.
patent: 6908796 (2005-06-01), Furusawa
patent: 7067069 (2006-06-01), Shiho et al.
patent: 7078276 (2006-07-01), Zurcher et al.
patent: 7314513 (2008-01-01), Zurcher et al.
patent: 2001/0021760 (2001-09-01), Matsuki et al.
patent: 2003/0045632 (2003-03-01), Shiho et al.
patent: 2003/0087110 (2003-05-01), Furusawa et al.
patent: 2003/0148024 (2003-08-01), Kodas et al.
patent: 2003/0229190 (2003-12-01), Aoki et al.
patent: 2004/0029364 (2004-02-01), Aoki et al.
patent: 2004/0248429 (2004-12-01), Aoki
patent: 2005/0176183 (2005-08-01), Aoki
patent: 2005/0181566 (2005-08-01), Machida et al.
patent: 2006/0159859 (2006-07-01), Iwasawa
patent: 2006/0185712 (2006-08-01), Shiho et al.
patent: 2006/0198966 (2006-09-01), Kaino et al.
patent: 2008/0085373 (2008-04-01), Karshtedt et al.
patent: 1297578 (2001-05-01), None
patent: 1407018 (2003-04-01), None
patent: 3122992 (1982-02-01), None
patent: 1 085 560 (2001-03-01), None
patent: 1 085 579 (2001-03-01), None
patent: 1 087 433 (2001-03-01), None
patent: 1087428 (2001-03-01), None
patent: 1 113 502 (2001-07-01), None
patent: 0 902 030 (2002-10-01), None
patent: 1 284 306 (2003-02-01), None
patent: 1 357 154 (2003-10-01), None
patent: 2077710 (1981-12-01), None
patent: 57-27915 (1982-02-01), None
patent: 60-242612 (1985-12-01), None
patent: 4-334551 (1992-11-01), None
patent: 5-230219 (1993-09-01), None
patent: 6-191821 (1994-07-01), None
patent: 7-267621 (1995-10-01), None
patent: 9-45922 (1997-02-01), None
patent: 9-237927 (1997-09-01), None
patent: 11-79727 (1999-03-01), None
patent: 11-171528 (1999-06-01), None
patent: 2000-7317 (2000-01-01), None
patent: 2000-31066 (2000-01-01), None
patent: 2002-203794 (2002-07-01), None
patent: 2002-246384 (2002-08-01), None
patent: 2003-55556 (2003-02-01), None
patent: 2003-92297 (2003-03-01), None
patent: 2003-124486 (2003-04-01), None
patent: 2003-313299 (2003-11-01), None
patent: 2003-318120 (2003-11-01), None
patent: 2004-311945 (2004-11-01), None
patent: 2005-219981 (2005-08-01), None
patent: 00/59022 (2000-10-01), None
patent: 0059014 (2000-10-01), None
patent: 0059041 (2000-10-01), None
patent: 2004/110929 (2004-12-01), None
T. Don Tilley; The Coordination Polymerization of Silanes to Polysilanes by a “σ-Bond Metathesis” Mechanism. Implications for Linear Chain Growth; pp. 22-29; Acc. Chem. Res.; vol. 26, No. 1, 1993; American Chemical Society.
Vladimir K. Dioumaev and John F. Ford; A Systematic Analysis of the Structure-Reactivity Trends for Some ‘Cation-Like’ Early Transition Metal Catalysts for Dehydropolymerization of Silanes; Journal of Organometallic Chemistry, 521 (1996) 133-143; Elsevier Science S.A.
Qingzheng Wang and Joyce Y. Corey; Dehydrocoupling Reactions of Hydrosilanes with Group 4 Mettallocenes Cp2MY2 (M=Ti, Zr, Hf, Y=F, OPh, NMe2); Can. J. Chem., vol. 78, 2000; pp. 1434-1440; NRC Canada.
Wenzhuo Guo, Vladimir Kdioumaev and Joerg Rockenberger; Doped Polysilanes, Compositions Containing the Same, Methods for Making the Same, and Films Formed Therefrom; U.S. Appl. No. 11/249,167; filed Oct. 11, 2005; Kovic, Inc., Sunnyvale, CA.
Maazhira Furusawa et al.; Formation method of allican thin film; Patent Abstracts of Japan; Jul. 19, 2002: Publication No. JP 2002203794 A; Japanase Intallectual Property Office, Japan.
Yutaka Kitsuno et al.; Method for tarming poly crystal silicon films; Patent Abstracts of Japan: Feb. 14, 1997; Publication No. JP 09045922 A; Japanese Intellectual Property Office, Japan.
Katara Yano et al.; Formation of Silicon membrane; Patent Abstracts of Japan; Oct. 17, 1995; Publication No. JP 07267621 A; Japanese Intellectual Property Office, Japan.
Kotaro Yano et al.; Higher order allano containing solution for torning allicon film; Patent Abstracts of Japan; Jul. 12, 1994; Publication No. JP 06191821 A; Japanese Intellectual Property Office, Japan.
Yuklo Nishimura et al.; Deposition film forming methed; Patent Abatracts of Japan; Dec. 2, 1985; Publication No. JP 60242612 A; Japanese Intellectual Property Office, Japan.
Phillip John, Michael John Tricker and Michael John Kingston Thomas; Process for Preparing Polysilane; esp@cenet; Abstract of Publication No. DE3122992; Publication Date: Feb. 4, 1982; esp@cenet Database—Worldwide, http://v3.espacenet.com/textdoc?DB=EPODOC&IDX=DE3122992&F=0.
Ryuji Sato, Yasuo Nomura, Masashi Nakajima, and Yoshiharu Okumura; Polymerization Catalyst of Hydrosilane; Patent Abstracts of Japan; Publication No. 04-334551; Publication Date: Nov. 20, 1992; Japan Patent Office, Japan.
Tamejirou Hiyama and Yasuo Hatanaka; Production of Alpha, Omega-Dihydropolysilane; Patent Abstracts of Japan; 10 pages; Publication No. 05-230219; Publication Date: Sep. 7, 1993; Japan Patent Office, Japan.
Karl Hassler, Ulrike Katzenbeisser and Barbara Reiter; Verbesserte Synthesen von Phenyltrisilanen; Journal of Organometallic Chemistry; 1994; pp. 193-196; vol. 479; Elsevier Science S.A.
F. Feher, P. Plichta and R. Guillery; Beitrage zur Chemie des Siliziums und Germaniums XIV uber die Umsetzung Von Kaliumsilyl mit Phenylbromsilanen und Phenylbromgermanen Darstellung Von Phenylsilylkalium; Tetrahedron Letters; Oct. 6, 1970; No. 5
Dioumaev Vladimir K.
Guo Wenzhuo
Ridley Brent
Rockenberger Joerg
Fortney Andrew D.
Gulakowski Randy
Kovio, Inc
Loewe Robert
LandOfFree
Polysilane compositions, methods for their synthesis and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polysilane compositions, methods for their synthesis and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polysilane compositions, methods for their synthesis and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4057493