Polyphosphazene polymers containing N-substituted amido and imid

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate

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Details

528315, 528321, 528363, 528323, 528399, C08G 8300, C08G 7300

Patent

active

042185572

ABSTRACT:
Polyphosphazene polymers are prepared which contain repeating units represented by the formulas: ##STR1## wherein X is represented by: ##STR2## wherein Y is selected from the group consisting of ##STR3## and --SO.sub.2 -- and p=0 or 1; when p=0, R.sub.1 and R.sub.2 are independently selected from a group consisting of substituted or unsubstituted aliphatic, aryl, araryl, and alkylaryl radicals or R.sub.1 and R.sub.2 can form a cyclic amide containing radical wherein R.sub.1 and R.sub.2 taken together are selected from a group consisting of --CH.sub.2).sub.n where n=2 to 12, wherein R.sub.3 is a lower alkyl radical or hydrogen; and when p=1, R.sub.1 and R.sub.2 taken together form a linkage in a cyclic imide containing radical selected from a group consisting of --CH.sub.2).sub.n, where n'=2 or 3 and ##STR4## where R.sub.3 is as defined above, R.sub.4 is selected from the group consisting of hydrogen, halogen and alkyl radical containing 1 to 6 carbon atoms; and p' is 0 to 4, X' is a substituted or unsubstituted alkoxy, aryloxy, amino or mercapto substituent group or mixtures thereof which are compatible with an N-substituted amido substituent and are known in the state of the art of polyphosphazene technology; and 20.ltoreq.(w+y+z).ltoreq. 50,000 per polymer and (y+z)>0.
The polymers of the invention can be utilized to form protective films and can also be utilized in applications such as for molding, coatings, foams and the like.

REFERENCES:
patent: 3893980 (1975-07-01), Allcock et al.

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