Polymers which can be cross-linked by photopolymerization

Gas separation: apparatus – Electric field separation apparatus – Electrode cleaner – apparatus part flusher – discharger – or...

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96115P, 20415915, 20415922, 20415923, G03C 500, G03C 168

Patent

active

040010163

ABSTRACT:
Relief or resist images can be produced by means of a photosensitive material including a photosensitive layer with a polymer as defined hereinafter containing vinyl groups capable of being cross-linked upon exposure to actinic light to yield unsoluble cross-linked products at the exposed areas while the polymer in the unexposed areas remain soluble.

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patent: 3620733 (1971-11-01), Steppan et al.
patent: 3764501 (1973-10-01), Hori et al.
patent: 3858510 (1975-01-01), Kai et al.

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