Polymers for photoresist compositions

Details Polymers for photoresist compositions Polymers for photoresist compositions

1999-05-19

2000-09-26

Teskin, Fred

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

525242, 5253333, C08F 804, C08F11204

Patent

active

061244058

ABSTRACT:
Polymers having an average molecular weight M.sub.w (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), comprising structural repeating units of the formulae I-IV: ##STR1## in which R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 and w, x, y, and z are defined herein, are suitable as binders for DUV photoresists of high processing stability and flow resistance.

REFERENCES:
patent: 4603101 (1986-07-01), Crivello
patent: 5286600 (1994-02-01), Ochiai et al.
patent: 5352564 (1994-10-01), Takeda et al.
patent: 5362600 (1994-11-01), Sinta et al.
patent: 5403695 (1995-04-01), Hayase et al.

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