Polymers for photoresist and photoresist compositions using...

Details Polymers for photoresist and photoresist compositions using... Polymers for photoresist and photoresist compositions using...

2006-01-17

2006-01-17

Zalukaeva, Tatyana (Department: 1713)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S259000, C526S270000, C526S271000, C526S272000, C526S313000, C526S348400, C430S296000, C430S270210

Reexamination Certificate

active

06987155

ABSTRACT:
The present invention relates to photoresist monomers, polymers formed therefrom and photoresist compositions suitable for photolithography processes employing a DUV light source, such as KrF (249 nm) and ArF(193 nm); EUV; VUV; E-beam; ion-beam; and X-ray. Photoresist monomers of the present invention are represented by the following Chemical Formula 1:wherein, m is 1 or 2.Polymers of the present invention comprise repeating units derived from the comonomer of Chemical Formula 1, preferably together with monomers of the following Chemical Formula 2:wherein,R* is an acid-labile group, andl is 1 or 2.

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