Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound – Group iiia metal or beryllium
Patent
1995-09-05
1996-07-09
Bos, Steven
Chemistry of inorganic compounds
Treating mixture to obtain metal containing compound
Group iiia metal or beryllium
210732, 210733, C01F 700, B01D 2100
Patent
active
055342353
ABSTRACT:
The invention comprises a process for improved flocculation of Bayer process red mud-containing slurry. The improvement comprises adding to the red mud-containing liquor a phosphonic acid polymer optionally in addition to the conventional flocculant. The polymer is added to the red mud-containing liquor in an amount sufficient to reduce the concentration of suspended solids in the supernatant phase and/or increase the rate of sedimentation.
REFERENCES:
patent: 3085853 (1963-04-01), Lesinski et al.
patent: 3390959 (1968-07-01), Sibert
patent: 3397953 (1968-08-01), Galvin et al.
patent: 3445187 (1969-05-01), Sibert
patent: 3541009 (1970-11-01), Arendt et al.
patent: 3681012 (1972-08-01), Sibert
patent: 4678585 (1987-07-01), Brownrigg
patent: 4678840 (1987-07-01), Fong et al.
patent: 4767540 (1988-08-01), Spitzer et al.
patent: 5008089 (1991-04-01), Moody et al.
patent: 5217620 (1993-06-01), Mahoney et al.
Environmental Phosphorus Handbook, by E. J. Griffith, et al, pp. 258-259, no date.
"The Hydrolysis of Phosphonate Esters", by R. F. Hudson, et al, pp. 2463-2469, 1956, no month, no journal reference.
Mahoney Robert P.
Reed Peter E.
Bos Steven
Charlier Patricia A.
Drake James J.
Miller Robert A.
Nalco Chemical Company
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