Polymers comprising both polyamide-diacid/polyetherdiol blocks a

Details Polymers comprising both polyamide-diacid/polyetherdiol blocks a Polymers comprising both polyamide-diacid/polyetherdiol blocks a

1994-08-10

1996-11-12

Hampton-Hightower, P.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From carboxylic acid or derivative thereof

528272, 528274, 528292, 528310, 528318, 528323, 528326, 528332, 528336, 525411, 525420, 525926, 525927, C08G 6944, C08L 7712

Patent

active

055741282

ABSTRACT:
Polyetheresteramides, characterized in that they comprise both of the following repeating entities: ##STR1## in which X represents the residue of a polyamide-diacid oligomer with an Mn of between 300 and 8000, Y represents the residue of a polyetherdiol with an Mn of between 200 and 5000, and Z represents the residue of a polyetherdiamine with an Mn of between 200 and 5000, wherein the proportion by mass of the entities Z resulting from the condensation of the polyetherdiamine with respect to the total amount of the entities resulting from the polyetherdiol and polyetherdiamine, i.e. Z/(Z+Y), is between 1 and 50%. The polyetheresteramides according to the invention can be used as is and are suitable for the production of mouldings, extrudates, films, sheaths, or composite materials such as multi-layer film. They can also be mixed with other polymers and in particular with polyamides. Additives such as heat stabilizers, antioxidizing agents, dyes, inorganic fillers, or various organics can also be added to them.

REFERENCES:
patent: 4345052 (1982-08-01), Mumcu et al.
patent: 4345064 (1982-08-01), Mumcu
patent: 4349661 (1982-09-01), Mumcu
patent: 4361680 (1982-11-01), Borg et al.

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