Polymers and chemically amplified positive resist compositions

Details Polymers and chemically amplified positive resist compositions Polymers and chemically amplified positive resist compositions

1996-04-11

1998-12-01

Smith, Jeffrey T.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C08F 1224

Patent

active

058440577

ABSTRACT:
The invention provides a novel polymer comprising a recurring unit of formula. (1) wherein R.sup.1 is hydrogen or methyl, R.sup.2 is hydrogen or acid labile group, at least one R.sup.2 being hydrogen and at least one R.sup.2 being an acid labile group, and n=2 or 3. The polymer's Mw is 3,000-300,000. Blending the polymer as a base resin with an organic solvent and a photoacid generator yields a chemically amplified positive resist composition. ##STR1##

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