Polymerized films, medium related members, and process for makin

Details Polymerized films, medium related members, and process for makin Polymerized films, medium related members, and process for makin

1989-03-03

1991-11-26

Herbert, Jr., Thomas J.

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Web or sheet containing structurally defined element or...

Physical dimension specified

427 38, 427 47, 428457, 428900, B32B 1508, B05D 306, B05D 314

Patent

active

050681460

ABSTRACT:
A plasma-polymerized film is formed by depositing and polymerizing a metal element-containing material forming an electrode and a gaseous polymerizable carbon-containing reactant in a plasma atmosphere. The polymerized film contains the metal element Mt and carbon C in an atomic ratio Mt/(C+Mt) of at least 1/100. The polymerized film is prepared under a condition W/(F.M) of at least 10.sup.8 joule/kg wherein W is a power applied for plasma generation in joule/sec., F is a flow rate of the gaseous reactant, and M is the molecular weight of the gaseous reactant, F.M being expressed in kg/sec. Such a polymerized film is advantageously applied as a coating to a surface of a member which constructs or is disposed in a casing in which a tape or disk-shaped medium is received for travel or rotating motion.

REFERENCES:
patent: 4880687 (1989-11-01), Yokoyama et al.
patent: 4889767 (1989-12-01), Yokoyama et al.

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