Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...
Reexamination Certificate
2006-05-09
2006-05-09
Seidleck, James J. (Department: 1711)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Compositions to be polymerized by wave energy wherein said...
C522S096000, C522S109000, C522S110000, C522S113000, C522S114000, C522S116000, C522S117000, C430S269000, C430S270100, C430S270110, C430S280100, C430S281100, C430S287100, C430S288100, C528S044000, C528S048000, C528S049000, C528S066000, C528S067000, C528S075000, C528S080000, C528S081000
Reexamination Certificate
active
07041711
ABSTRACT:
To provide a polymerizable composition suitable for a lithographic printing plate precursor which can satisfy the requirements of high sensitivity, excellent storage stability and long press life and enables direct plate making from digital data from computer, etc. when recording is conducted a solid laser or semiconductor laser emitting ultraviolet ray, visible light or infrared ray and a compound therefore, the present invention relates to a photoradical polymerizable composition comprising a polyfunctional crosslinking agent having a specific structure represented by formula (I) or (II) defined in the specification.
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Nakamura, Shinya et al., Database Chemabs Online! Chemical Abstracts Serivce, Columbus, OH, US “Actinic ray-curable coating compositions with good curability” XP002292102 retrieved from STN Database accession No. 134:164565 see RN 325147-27-1 (abstract) & JP 2001 040039 A2 (Dainippon Ink and Chemicals, Inc., Japan) Feb 13, 2001.
Assumption, Heidi J. et al., Database Chemabs Online! Chemical Abstracts Service, Columbus, OH, US “Photopolymerization of urethane dimethacrylates synthesized via a non-isocycanate route” XP002292103 retrieved from STN Database accession No. 138:402115 see RN 528819-25-2 (abstract) & Polymer Preprints (American Chemical Society, Division of Polymer Chemistry), 44(1), 136-137 Coden: ACPPAY; ISSN 0032-3934, 2003.
Fujimoto, Toshikazu, Database Chemabs Online! Chemical Abstracts Service, Columbus, OH, US; “Radiation-curable composition and its cured film for manufacture of shadow mask or aperture grille” XP002292104 retrieved from STN Database accession No. 139:157382 see RN 325147-27-1 (abstract) & JP 2003 221420 A2 (Mitsubishi Rayon Co., Ltd., Japan) Aug. 5, 2003.
Fuji Photo Film Co. , Ltd.
McClendon Sanza L.
Seidleck James J.
Sughrue & Mion, PLLC
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