Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...
Patent
1995-05-31
1996-08-27
Chapman, Mark
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Compositions to be polymerized by wave energy wherein said...
522904, 556 64, C08F 246
Patent
active
055501710
ABSTRACT:
The invention is a polymeric photoinitiator having the formula: ##STR1## wherein n=10 to 50; each of a and b may be 0-4 while c is 0-5; A is an alkyl or aryl group; X is an anion; and each of R, R', and R" is independently H or one or more groups substituted onto the respective phenyl moieties. The substituted groups are independently selected from various kinds of groups excluding basic groups such as amino groups. Preferably, they are a hydrogen atom, halogen atom (e.g., F, Cl, Br, and I), nitro group, alkoxy group (e.g., CH.sub.3 O-- and C.sub.2 H.sub.5 O--), C.sup.1 -C.sub.18 aliphatic group (e.g., hydrocarbon group such as CH.sub.3 --, C.sub.2 H.sub.5 --, and (CH.sub.3).sub.2 CH--; cyclic hydrocarbon group such as cyclohexyl group; and those which contain a heteroatom in the main chain or substituent group. The substituted groups may also be a C.sub.1 -C.sub.18 aliphatic group having at least one hydroxyl group or a C.sub.3 -C.sub.19 aliphatic group having a group of --OCH.sub.2 CH.sub.2 O--. The invention also comprises a method of synthesizing this polymer and adhesive compositions and computer components using and made with the polymeric photoinitiator of the invention. The invention also comprises a method of reducing outgassing from the component parts of data storage systems.
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Chapman Mark
International Business Machines - Corporation
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