Polymeric polishing pad having photolithographically induced sur

Details Polymeric polishing pad having photolithographically induced sur Polymeric polishing pad having photolithographically induced sur

1998-01-12

2000-03-14

Eley, Timothy V.

Abrading

Abrading process

Utilizing fluent abradant

51298, 51293, 451550, C09K 314, B24B 100

Patent

active

06036579&

ABSTRACT:
An innovative method of manufacturing polishing pads using photocuring polymers and photolithography. The photolithography enables the creation of useful surface patterns not possible with conventional machining techniques and enables the use of pad materials otherwise too soft to pattern by conventional machining techniques.

REFERENCES:
patent: 3504457 (1970-04-01), Jacobsen et al.
patent: 3905816 (1975-09-01), Boardman et al.
patent: 3924520 (1975-12-01), Boardman et al.
patent: 4137081 (1979-01-01), Pohl
patent: 4174218 (1979-11-01), Pohl
patent: 4198238 (1980-04-01), Scheve
patent: 4266007 (1981-05-01), Hughes et al.
patent: 4332873 (1982-06-01), Hughes et al.
patent: 4442302 (1984-04-01), Pohl
patent: 4456500 (1984-06-01), Ibata
patent: 4518677 (1985-05-01), Pohl
patent: 4836832 (1989-06-01), Tumey et al.
patent: 4927431 (1990-05-01), Buchanan et al.
patent: 4927432 (1990-05-01), Budinger et al.
patent: 5197999 (1993-03-01), Thomas
patent: 5209023 (1993-05-01), Bizer
patent: 5209027 (1993-05-01), Ishida et al.
patent: 5209760 (1993-05-01), Wiand
patent: 5212910 (1993-05-01), Breivogel et al.
patent: 5216843 (1993-06-01), Breivogel et al.
patent: 5341799 (1994-08-01), Fifield et al.
patent: 5381735 (1995-01-01), Fifield et al.
patent: 5489233 (1996-02-01), Cook et al.
patent: 5578362 (1996-11-01), Reinhardt et al.
patent: 5582672 (1996-12-01), Follet et al.
patent: 5766277 (1998-06-01), DeVoe et al.

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