Polymeric mold for providing a micro-scale part

Details Polymeric mold for providing a micro-scale part Polymeric mold for providing a micro-scale part

2005-01-11

2005-01-11

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Use of sound or nondigital compressive force

C430S320000, C430S325000, C430S326000

Reexamination Certificate

active

06841306

ABSTRACT:
The invention is a developer system for developing a PMMA photoresist having exposed patterns comprising features having both very small sizes, and very high aspect ratios. The developer system of the present invention comprises a developer tank, an intermediate rinse tank and a final rinse tank, each tank having a source of high frequency sonic agitation, temperature control, and continuous filtration. It has been found that by moving a patterned wafer, through a specific sequence of developer/rinse solutions, where an intermediate rinse solution completes development of those portions of the exposed resist left undeveloped after the development solution, by agitating the solutions with a source of high frequency sonic vibration, and by adjusting and closely controlling the temperatures and continuously filtering and recirculating these solutions, it is possible to maintain the kinetic dissolution of the exposed PMMA polymer as the rate limiting step.

REFERENCES:
patent: 4393129 (1983-07-01), Glashauser et al.
patent: 5876875 (1999-03-01), Chiu
patent: 6372389 (2002-04-01), Watanabe

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