Polymeric materials and their use as resists

Details Polymeric materials and their use as resists Polymeric materials and their use as resists

1988-01-19

1989-12-05

Welsh, J. David

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

525308, 430910, C08F26504, C08F26706

Patent

active

048853445

ABSTRACT:
Polymeric materials useful as positive resists comprise a backbone formed from an addition polymer which is degradable by radiation and at least 3 pendant polymeric groups which show no appreciable positive resist characteristics. Preferably these materials comprise a backbone which is a polymethacrylate ester and from 3 to 5 pendant polystyrene groups. These polymers exhibit increased sensitivity and resistance to plasma processing and provide resists which are useful as components of integrated circuits.

REFERENCES:
patent: 4732831 (1988-03-01), Riesenfeld

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