Polymeric inhibitors for enhanced planarization

Compositions – Etching or brightening compositions

Reexamination Certificate

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Details

C252S079400, C438S692000

Reexamination Certificate

active

11093806

ABSTRACT:
The invention provides a chemical-mechanical polishing system comprising a polishing component, a surfactant, and a liquid carrier. The invention further provides a method of chemically-mechanically polishing a substrate with the polishing system.

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