Polymeric anti-reflective compounds

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

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Details

525451, 525502, 525508, C08L 6110, C08L 3312

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active

055978681

ABSTRACT:
Anti-reflective coatings and methods for forming these anti-reflective coatings are disclosed that have a polymer chemistry and optical characteristics suitable for suppressing the light that reflects off a circuit substrate during a photolithographic process. These anti-reflective coatings include a phenolic polymer material and an epoxide-containing polymer material that can be combined in a select proportion to form a thermally curable polymeric anti-reflective coating. The select proportions of the combined materials tailors the optical characteristic of the anti-reflective coating to attenuate energy about a select range of wavelengths.

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patent: 5045431 (1991-09-01), Allen et al.
patent: 5071730 (1991-12-01), Allen et al.
patent: 5190992 (1993-03-01), Kato et al.
Yen et al., "An Anti-Reflective Coating for Use with PMMA at 193 nm", J. Electrochem Soc., vol. 139, No. 2, pp. 616-619 (1992).
Horn, "Antireflection Layers and Planarization for Microlithography", Solid State Technology, pp. 57-62 (1991).
"A New Multifunctional Coating that Replaces Adhesion Promoter, Anti-reflective Coating and Release Layer with One Easy to Apply Coat for Photolithography", Brewer Science, Inc.

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