Coating processes – Nonuniform coating – Applying superposed diverse coatings or coating a coated base
Reexamination Certificate
2008-01-25
2011-10-18
Bernatz, Kevin M. (Department: 1785)
Coating processes
Nonuniform coating
Applying superposed diverse coatings or coating a coated base
C428S848800, C428S339000, C428S220000, C428S847000, C427S374200, C427S388200
Reexamination Certificate
active
08039056
ABSTRACT:
A polymer thin film in which cylindrical phases are distributed in a continuous phase and are oriented in a pass-through-direction of the film includes at least: a first block copolymer including at least a block chain A1, as a component of the continuous phase, composed of polymerized monomers a1, and a block chain B1, as a component of the cylindrical phases, composed of polymerized monomers b1; and a second block copolymer including at least a block chain A2, as a component of the continuous phase, composed of polymerized monomers a2, and a block chain B2, as a component of the cylindrical phases, composed of polymerized monomers b2, with the second copolymer having a degree of polymerization different from that of the first copolymer. A film thickness of the polymer thin film and an average center distance between adjacent cylindrical phases have a relation represented by a predetermined expression.
REFERENCES:
patent: 2002/0055239 (2002-05-01), Tuominen et al.
patent: 2002/0135880 (2002-09-01), Fink et al.
patent: 2003/0118800 (2003-06-01), Thomas et al.
patent: 2004/0143063 (2004-07-01), Chen et al.
patent: 2006/0231525 (2006-10-01), Asakawa et al.
patent: 2008/0290067 (2008-11-01), Yoshida et al.
Ryu et al; Science, vol. 308 pp. 236-239; Apr. 8, 2005.
Park et al; Polymer, vol. 44, Apr. 2003 p. 6725-6760.
Fasolka et al; Macromolecules, Jun. 29, 2000, p. 5702-5712.
Chen Feng
Hasegawa Hirokazu
Takenaka Mikihito
Yoshida Hiroshi
Antonelli, Terry Stout & Kraus, LLP.
Bernatz Kevin M.
Falasco Louis
Hitachi , Ltd.
LandOfFree
Polymer thin film, patterned substrate, patterned medium for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polymer thin film, patterned substrate, patterned medium for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polymer thin film, patterned substrate, patterned medium for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4291162