Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-10-31
2006-10-31
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C355S018000, C359S754000, C428S522000, C524S462000, C524S795000
Reexamination Certificate
active
07129009
ABSTRACT:
This invention relates to a fluoropolymer nanocomposite comprising a fluoropolymer phase and an inorganic oxide phase dispersed throughout, said inorganic oxide phase having either no particles or particles substantially all of which have a particle size of less than about 75 nm which can be determined by small angle x-ray scattering and transmission electron microscopy techniques. These nanocomposites are useful as protective coatings.
REFERENCES:
patent: 3462401 (1969-08-01), Kometani et al.
patent: 3616371 (1971-10-01), Ukihashi et al.
patent: 5051114 (1991-09-01), Nemser et al.
patent: 5182342 (1993-01-01), Feiring et al.
patent: 5356668 (1994-10-01), Paton et al.
patent: 5760139 (1998-06-01), Koike et al.
patent: 5853894 (1998-12-01), Brown
patent: 5883177 (1999-03-01), Colaianna et al.
patent: 6156389 (2000-12-01), Brown et al.
patent: 6156824 (2000-12-01), Yamada et al.
patent: 6203912 (2001-03-01), Watakabe et al.
patent: 6248823 (2001-06-01), Hrivnak et al.
patent: 6548129 (2003-04-01), Matsukura et al.
patent: 6706796 (2004-03-01), Rao et al.
patent: 2002/0065383 (2002-05-01), Maccone et al.
patent: 2003/0026574 (2003-02-01), Suzuki et al.
patent: 2004/0030074 (2004-02-01), Tsuda et al.
patent: 196 40 972 (1998-04-01), None
patent: 0 584 703 (1994-03-01), None
patent: 0 676 458 (1995-10-01), None
patent: 0 889 066 (1999-01-01), None
patent: 0 889 067 (1999-01-01), None
patent: 0 889 092 (1999-01-01), None
patent: 0 907 088 (1999-04-01), None
patent: 2-129254 (1990-05-01), None
patent: 11-209685 (1999-03-01), None
patent: WO 94/05498 (1994-03-01), None
patent: WO 96/24625 (1996-08-01), None
patent: WO 96/34052 (1996-10-01), None
patent: WO 97/01599 (1997-01-01), None
patent: WO 97/11134 (1997-03-01), None
patent: WO 00/01758 (2000-01-01), None
patent: WO 01/85811 (2001-11-01), None
patent: WO 02/44226 (2002-06-01), None
Switkes et. al., Immersion Lithography Beyond the 65 NM Node with Optics, Microlithography, 2003, pp. 4-6, 18 and 20, Massachusetts.
Switkes, Resolution Enhancement of 157 NM Lithography by Liquid Immersion, Proceedings of SPIE, 2002, pp. 459-465, vol. 4691, Massachusetts.
Switkes et. al., Immersion Liquids for Lithography in the Deep Ultraviolet, Proceedings of SPIE, 2003, pp. 690-699, vol. 5040, Massachusetts.
Albrecht, VUV Absorbing Vapours in N-perfluorocarbons, European Organization for Nuclear Research, 2002, pp. 1-14.
Seki et. al., Electronic Structure of Poly(Tetrafluoroethylene) Studied by UPS, VUV Absorption and Brand Calculations, Physica Scripta, 1990, pp. 187-171, vol. 41, Japan.
Belanger et. al., The Far Ultraviolet Spectra of Perfluoro-Normal-Paraffins, Chemical Physics Letters, 1969, pp. 649-651, vol. 3, No. 5, Canada.
Lombos et. al., The Electronic Spectra of Normal Paraffin Hydrocarbons, Chemical Physics Letters, 1967, pp. 42-43, vol. 1, Amsterdam.
French Roger Harquail
Wheland Robert Clayton
E. I. du Pont de Nemours and Company
Schilling Richard L.
LandOfFree
Polymer-liquid compositions useful in ultraviolet and vacuum... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polymer-liquid compositions useful in ultraviolet and vacuum..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polymer-liquid compositions useful in ultraviolet and vacuum... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3680475