Polymer for photosensitive resin composition and method for maki

Details Polymer for photosensitive resin composition and method for maki Polymer for photosensitive resin composition and method for maki

1999-01-13

2000-12-12

Chu, John S.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

526 80, 526279, 5263071, 5263072, 430 28, G08F22602

Patent

active

061600628

ABSTRACT:
A PDMA polymer for a photosensitive resin composition. The PDMA polymer is obtained by polymerizing an acrylamide, N,N-dimetylacrylamide monomer, and a vinyl-type silane. The PDMA polymer having a molecular weight of 1,000,000.about.2,000,000 and having a formula as follows: ##STR1##

REFERENCES:
patent: 4154910 (1979-05-01), Tanaka et al.
patent: 4521580 (1985-06-01), Turner et al.
patent: 5725978 (1998-03-01), Miyazawa et al.
patent: 6020093 (2000-02-01), Shibuya et al.

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