Polymer compound, resist material and pattern formation method

Details Polymer compound, resist material and pattern formation method Polymer compound, resist material and pattern formation method

2006-06-13

2006-06-13

Ashton, Rosemary (Department: 1752)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S242000, C526S313000, C526S319000, C526S329700, C430S270100, C430S326000

Reexamination Certificate

active

07060775

ABSTRACT:
The base polymer of a resist material contains a polymer compound including a first unit represented by a general formula of the following Chemical Formula 5 and a second unit represented by a general formula of the following Chemical Formula 6:wherein R1, R2, R3, R7, R8and R9are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5, R6and R11are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; R12is a fluorine atom, or a straight-chain fluoridated alkyl group or a branched or cyclic fluoridated alkyl group with a carbon number not less than 1 and not more than 20; 0<a<1; 0<b<1; d is 1 or 2; e is 0, 1, 2, 3 or 4; and 1≦d+e≦5.

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