Polyimides, process for producing the same and photosensitive co

Details Polyimides, process for producing the same and photosensitive co Polyimides, process for producing the same and photosensitive co

1999-02-26

2000-08-01

Hampton-Hightower, P.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

528 26, 528172, 528173, 528174, 528176, 528183, 528185, 528188, 528220, 528229, 528350, 528352, 528353, 525420, 525421, 525431, 525436, 524600, 524606, 430170, 4302701, 4302811, 4302831, C08G 7310, C08G 77445

Patent

active

060968508

ABSTRACT:
Polyimide is produced by reacting two kinds of diamine compounds consisting of diaminopolysiloxane and a hydroxyl group-containing diamine or three kinds of diamine compounds consisting of diaminopolysiloxane, a hydroxyl group-containing diamine and an aromatic or alicyclic diamine with a 4,4'-(hexafluoroisopropylidene)diphthalic acid dianhydride, thereby once forming a polyamic acid, and subjecting the polyamic acid to polyimidization reaction. The resulting polyimide itself is soluble in low boiling organic solvents for general purpose use, typically methyl ethyl ketone. A photosensitive composition comprising the polyimide, a photo crosslinking agent and a photo acid-generating agent forms a negative type polyimide pattern upon development with an aqueous alkali solution.

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patent: 5714572 (1998-02-01), Kato
patent: 5847071 (1998-12-01), Hagiwara et al.
patent: 5859181 (1999-01-01), Zhao et al.
patent: 5866627 (1999-02-01), Czarnyj et al.
patent: 5942592 (1999-08-01), Zhau et al.

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