Coating processes – Nonuniform coating – Mask or stencil utilized
Patent
1997-03-18
1998-11-24
Yoon, Tae
Coating processes
Nonuniform coating
Mask or stencil utilized
430322, 101114, B41M 112, B05D 132
Patent
active
058403698
ABSTRACT:
A polyimide precursor composition which is produced by (i) providing a polyamide acid solution obtained by reacting an aromatic tetracarboxylic acid component and a diamine component in the presence of an oxygen-containing solvent and (ii) subjecting said polyamide acid solution to heat treatment. The polyimide precursor composition exhibits a desirable apparent viscosity and a desirable thixotropic property and it excels in film forming ability, and because of this, it enables the formation a high quality relief pattern film with no defect and which excels in form retention by way of the screen printing.
Further, the polyimide precursor composition is extremely suitable for the formation of a relief pattern by way of screen printing in the production of electronic, electric, optical, or precision devices, wherein the relief pattern is required to have a reduced dielectric constant and a reduced residual stress and to have a sufficient heat resistance, moisture resistance, physical strength, and chemical stability.
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Hasegawa Seiji
Maruta Masamichi
Moroi Yoshihiro
Nanai Hidehisa
Takahashi Hiroshi
Central Glass Co. Ltd.
Yoon Tae
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