Polyimide copolymers and process for preparing the same

Stock material or miscellaneous articles – Composite – Of silicon containing

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528 26, 528 28, B32B 906

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050949195

ABSTRACT:
Polyimide copolymers of this invention have a repeating unit of the general formula (1) ##STR1## wherein Ar.sub.1 is a tetravalent organic radical containing at least one aromatic ring, R.sub.1 is a divalent organic radical, R.sub.2 and R.sub.3 are monovalent hydrocarbon radicals, and n is an integer from 0 to 4 and a repeating unit of the general formula (2) ##STR2## wherein Ar.sub.2 is a tetravalent organic radical containing at least one aromatic ring, R.sub.6 is a divalent organic radical, R.sub.7 is a monovalent hydrocarbon radical with 1 to 6 carbon atoms, and l is an integer from 5 to 50 and are capable of forming films of a microdomain structure useful for such applications as protective films on semiconductors, coatings adhesives, moldings, films, and separation membranes.

REFERENCES:
patent: 3325450 (1967-06-01), Holub
patent: 3740305 (1973-06-01), Hoback et al.
patent: 4040874 (1977-08-01), Yerman
patent: 4672099 (1987-06-01), Kunimune et al.
Patent Abstracts of Japan, vol. 3, No. 96 (E130), 15 Aug. 1979).
Bott, R. H. et al., "Synthesis and Characteristics of Novel Poly(Imide Siloxane) Segmented Copolymers", pp. 67-82, (1987).

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