Polyhydroxy compound and a positive photoresist containing the s

Details Polyhydroxy compound and a positive photoresist containing the s Polyhydroxy compound and a positive photoresist containing the s

1996-09-04

1998-09-15

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, 568720, G03F 7023

Patent

active

058076565

ABSTRACT:
A polyhydroxy compound represented by the following formula (I): ##STR1## and a positive resist composition which comprises an alkali-soluble resin, a quinonediazide sulfonic acid ester, and a polyhydroxy compound of formula (I) or a polyhydroxy compound represented by the following formula (C): ##STR2## which is satisfactory in properties such as sensitivity, resolution, .tau.-value and peeling off resistance.

REFERENCES:
patent: 5059507 (1991-10-01), Uetani et al.
patent: 5340686 (1994-08-01), Sakaguchi et al.
patent: 5376497 (1994-12-01), Kawata et al.
patent: 5407779 (1995-04-01), Uetani et al.
patent: 5413895 (1995-05-01), Tomioka et al.

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