Polyfunctional vinyl ether compound and photoresist resin compos

Organic compounds -- part of the class 532-570 series – Organic compounds – Oxygen containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

568641, 568646, C07C 4300

Patent

active

055105408

ABSTRACT:
A polyfunctional vinyl ether compound represented by formula (I): ##STR1## wherein n, which is an average repeating number, represents a number of from 0 to 20; R.sub.1 and R.sub.2 each independently represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an aralkyl group, an alkoxy group, an aryloxy group, or a cycloalkyl group; Q each independently represents --OH or a group represented by the formula --OROCH.dbd.CH.sub.2, wherein R represents an alkylene group having from 1 to 12 carbon atoms, the molar ratio of (--OH)/(--OROCH.dbd.CH.sub.2) being from 10/90 to 90/10; and A each independently represents a divalent hydrocarbon group having from 1 to 30 carbon atoms.

REFERENCES:
patent: 4388450 (1983-06-01), Crivello
patent: 4707558 (1987-11-01), Wang et al.
patent: 4978810 (1990-12-01), Kanayama et al.
patent: 4994346 (1991-02-01), Meier et al.
patent: 5004842 (1991-04-01), Klemarczyk et al.
patent: 5069997 (1991-12-01), Schwalm et al.
patent: 5070117 (1991-12-01), Kelmarczyk et al.
patent: 5079129 (1992-01-01), Roth et al.
patent: 5362822 (1994-11-01), Hefner
Database WPI, Section Ch, Week 8519, Derwent Publication, AN 85-112778.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Polyfunctional vinyl ether compound and photoresist resin compos does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polyfunctional vinyl ether compound and photoresist resin compos, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polyfunctional vinyl ether compound and photoresist resin compos will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2309975

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.