Polyether copolymers, resin compositions containing them, and mo

Details Polyether copolymers, resin compositions containing them, and mo Polyether copolymers, resin compositions containing them, and mo

1990-11-13

1992-09-22

Lesmes, George F.

Stock material or miscellaneous articles

Web or sheet containing structurally defined element or...

Including interlaminar mechanical fastener

428290, 428364, 428500, 428515, 428522, 428910, 524401, 524424, 524847, 525436, 525437, 525471, 525534, 525535, 525540, 528125, 528126, 528128, 528206, 528208, 528210, 528211, 528219, B32B 2700, C08G 6540

Patent

active

051495813

ABSTRACT:
A polyether copolymer comprising the repeating units represented by the following general formula (I) ##STR1## and the repeating units represented by the following formula (II) ##STR2## the molar ratio of (I)/{(I)+(II)} being from 0.1 to 0.8 and the polyether copolymer having a melt viscosity of at least 500 poise as measured at 400.degree. C. is produced by allowing a dihalogenobenzonitrile, 1,4-bis(4'-halobenzoyl)benzene, and 4,4'-biphenol to react with each other in an aprotic polar solvent in the presence of an alkali metal compound. The polyether copolymer exhibits excellent heat-resistance, solvent resistance, and mechanical strength, and is suitable as a material for resin compositions, heat-resistant laminates, fiber, and film.

REFERENCES:
patent: 3970681 (1976-07-01), Marvel et al.
patent: 4567248 (1986-01-01), Blinne et al.
patent: 4640974 (1987-02-01), Matsuo et al.
patent: 4766197 (1988-08-01), Clendinning et al.
patent: 4853443 (1989-08-01), Matsuo et al.
patent: 4968769 (1990-11-01), Wang
Patent Abstracts of Japan, vol. 10, No. 107 (C-341)[2164] Apr. 22, 1986 (abstract of JP 60-235835).

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