Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1978-03-22
1981-02-24
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430532, 430533, 430534, 430535, G03C 178
Patent
active
042528852
ABSTRACT:
Light-sensitive photographic films are produced by coating polyester films with aqueous dispersions of polyesters or copolyesters containing free-functional acid groups. Corona discharge treatment of the polyester or copolyester layers is disclosed for direct adhesion to photographic emulsions or indirect adhesion via a polymeric sub and/or gelatin sub.
REFERENCES:
patent: 2462151 (1949-02-01), Woodward
patent: 3563942 (1971-02-01), Heiberger
patent: 3615554 (1971-10-01), Takenaka
patent: 3941727 (1976-03-01), Timmerman et al.
patent: 4051302 (1977-09-01), Mayama
patent: 4093458 (1978-06-01), McGrail et al.
Mann David R.
McGrail Patrick T.
Bexford Limited
Brammer Jack P.
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