Polycyclic fluoroalkanes

Details Polycyclic fluoroalkanes Polycyclic fluoroalkanes

2006-08-01

2006-08-01

Richter, Johann (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Halogen containing

Reexamination Certificate

active

07084314

ABSTRACT:
Polycyclic fluoroalkanes that are highly transparent to UV wavelengths ranging from about 190 nm to 260 nm are provided. The polycyclic fluoroallkanes are suitable for use in a variety of applications, particularly in the vacuum UV and deep UV region of the electromagnetic spectrum. For example, the polycyclic fluoroalkanes are useful in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography, particularly at 193 and 248 nm exposure wavelength.

REFERENCES:
patent: 4647581 (1987-03-01), Kolhl et al.
patent: 2005035941 (2003-07-01), None
patent: 2005 035941 (2005-02-01), None
Mcbee et al., Diels-Alder Reactions with Fluorine containing Olefins, J. Amer. Chem. Soc., 1954, pp. 915-917, vol. 77.
J. March, Reactions, Mechanisms and Structure, Advanced Organic Chemistry, 4thEdition, 1992, pp. 598, 766 and 771.
Switkes et. al., Immersion Lithography at 157 NM. J. Vac. Sci. Technol. B. Nov./Dec. 2001, pp. 2353-2356, vol. 19 (6).
M. Switkes et. al., Resolution Enhancement of 157 NM Lithography by Liquid Immersion, Proc. Spie, 2002, pp. 459-465, vol. 4691.

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