Polycrystalline silicon wafer tray

Details Polycrystalline silicon wafer tray Polycrystalline silicon wafer tray

1986-11-03

1989-04-11

Nozick, Bernard

Plastic article or earthenware shaping or treating: apparatus

Female mold including tamping means or means utilizing mold...

425434, 425435, 264311, A01J 2100

Patent

active

048201456

ABSTRACT:
A polycrystalline silicon wafer having the step of flowing in a predetermined atmosphere molten liquid of silicon base material on a rotating fabrication tray toward a radial direction by means of a centrifugal force produced by the rotation of the tray, thereby forming a thin molten material layer of desired diameter with the molten liquid and solidifying the molten material, comprising a cover, at which a through hole is perforated at the ceiling wall thereof, detachably covered on the tray, a wafer-molding space formed to be surrounded by the cover and the tray, the molten material being filled in the wafer-molding space via the through hole to form a thin molten material layer. Thus, the wafers can be simultaneously formed without production of small projections of the surface of the wafers.

REFERENCES:
patent: 4350481 (1982-09-01), Corea et al.
patent: 4478567 (1984-10-01), Schaer
patent: 4479769 (1984-10-01), Simioni
patent: 4517140 (1985-05-01), Rawlings
patent: 4519764 (1985-05-01), Maeda et al.

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