Polycrystalline MgO deposition material having adjusted Si...

Compositions: ceramic – Ceramic compositions – Refractory

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C501S122000, C428S690000, C106S286600

Reexamination Certificate

active

06995104

ABSTRACT:
It is an object of the present invention to provide a polycrystalline MgO deposition material which is capable of obtaining a good discharge response characteristic over a wide temperature range. Additionally, it is another object of the present invention to provide a plasma display panel with an improved luminance and a material for the plasma display panel which can remarkably reduce the number of address ICs without lowering the panel luminance. In order to achieve the objects, there is provided an improvement of a polycrystalline MgO deposition material for a passivation layer of the plasma display panel. A characteristic structure is that the polycrystalline MgO deposition material is formed of a sintered pellet of polycrystalline MgO, of which MgO purity is more than 99.9% and relative density is more than 90%. Further, a Si concentration in the polycrystalline MgO is more than 30 ppm and less than 500 ppm.

REFERENCES:
patent: 2005/0045065 (2005-03-01), Sakurai et al.
patent: 10-297956 (1998-11-01), None
patent: 11-29355 (1999-02-01), None
patent: 11-29857 (1999-02-01), None
patent: 2000-63171 (2000-02-01), None
patent: 2000-103614 (2000-04-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Polycrystalline MgO deposition material having adjusted Si... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polycrystalline MgO deposition material having adjusted Si..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polycrystalline MgO deposition material having adjusted Si... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3666145

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.