Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From carboxylic acid or derivative thereof
Patent
1990-05-25
1991-05-14
Anderson, Harold D.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From carboxylic acid or derivative thereof
4284744, 524606, 524607, 528338, 528339, 528340, 528347, C08G 6932
Patent
active
050157264
ABSTRACT:
An amorphous polyamide having a high heat distortion temperature is produced by reacting toluenediamine with isophthalic acid, and optionally terephthalic acid, in the presence of either an aliphatic diacid, an aliphatic diamine or a mixture thereof. The polyamide provides the combined properties of a high heat distortion temperature, low shrinkage upon cooling, high levels of chemical resistance, is processable at temperatures below its degradation temperature, and has a high flexural modulus. With these combined properties the polyamide is particularly suitable for fiber reinforced automotive applications requiring exposure to excessive heat in conventional automotive paint bake ovens.
REFERENCES:
patent: 4418181 (1983-11-01), Monacelli
patent: 4501879 (1985-02-01), Barbee et al.
patent: 4539393 (1985-09-01), Tamura et al.
patent: 4567249 (1986-01-01), Fox et al.
patent: 4721772 (1988-01-01), Ueno et al.
patent: 4864009 (1989-09-01), Finke et al.
patent: 4885356 (1989-12-01), Milligan et al.
L. H. Gan, P. Blais, D. J. Carlsson, T. Suprunchuk and D. M. Wiles, Journal of Applied Polymer Science, 19; 69 (1975).
Peters Edward N.
Riding Geoffrey H.
Willard G. F.
Anderson Harold D.
Conard Spencer D.
General Electric Company
Mufatti William F.
LandOfFree
Polyamide from toluenediamine does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polyamide from toluenediamine, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polyamide from toluenediamine will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1649265