Polyamide ester photoresist formulations of enhanced sensitivity

Details Polyamide ester photoresist formulations of enhanced sensitivity Polyamide ester photoresist formulations of enhanced sensitivity

1986-01-15

1987-10-20

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430197, 430281, 430283, 430285, 430927, G03C 171, G03C 168, G03C 170

Patent

active

047013001

ABSTRACT:
Photoresist formulations for forming relief structures from highly heat-resistant polyimide polymers, containing in an organic solvent in essence at least

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patent: 4329556 (1982-05-01), Rubner et al.
patent: 4369247 (1987-01-01), Goff et al.
patent: 4540650 (1985-09-01), Klug et al.
patent: 4547455 (1985-10-01), Hiramoto et al.
patent: 4548891 (1985-10-01), Riediker et al.

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