Polyacetylenic lipids, radiation-sensitive compositions, photogr

Details Polyacetylenic lipids, radiation-sensitive compositions, photogr Polyacetylenic lipids, radiation-sensitive compositions, photogr

1981-10-21

1990-06-12

Warren, Charles F.

Chemistry of carbon compounds

Miscellaneous organic carbon compounds

C-metal

260400, 260404, 260405, 2604055, C07F 910

Patent

active

049331140

ABSTRACT:
A photopolymerizable monomer comprising a lipid having at least one hydrophobic acyl chain containing at least two conjugated acetylenic linkages is useful in preparing radiation-sensitive compositions and photographic elements comprising a plurality of liposomes. Further, processes for photopolymerizing the radiation-sensitive compositions and for forming an image in the photographic elements comprise exposing the lipid to radiation, heating the lipid to a temperature equal to or above a first transition temperature of the lipid to render it insensitive to further exposure, and optionally cooling the lipid to a temperature equal to or below a seocnd phase transition temperature of the lipid to render it again sensitive to further exposure. The monomeric lipids, when photopolymerized, form polymeric lipids exhibiting decreased solubility and liposome wall permeability as compared to the unpolymerized monomeric lipids.

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