Fishing – trapping – and vermin destroying
Patent
1994-10-20
1995-09-19
Fourson, George
Fishing, trapping, and vermin destroying
H01L 2176
Patent
active
054515408
ABSTRACT:
The present invention relates to a method for forming an oxide film on a semiconductor substrate by a buffer LOCOS method, has for its object to prevent anomalous formation of the oxide film and also to suppress a spread of a bird's beak from an oxide film forming region, and includes a process of forming a polycrystalline or amorphous silicon film 23 on a semiconductor substrate 21, a process of exposing the silicon film 23 to a fluoric acid medium, a process of forming an oxidation-resistant film 24 on the silicon film 23, a process of patterning the oxidation-resistant film 24, land oxidizing the silicon film 23 and the semiconductor substrate 21 selectively with the oxidation-resistant film 24 as a mask.
REFERENCES:
patent: 5215930 (1993-06-01), Lee et al.
Lutze, J. W. et al., Field Oxide Thinning in Poly Buffer LOCOS Isolation, Extended Abstracts, 175th Electrochemical Society Meeting, vol. 89-1 (1989)( pp. 289-290.
Su, W. D. et al., Pits Reduction for Poly Buffer LOCOS in VLSI Fabrication, Proceedings of Technical Paper 1991, International Symposium on VLSI Technology, Systems, & Applications, IEEE Catalogue No. 91TH368-1, pp. 43-46.
Hashimoto Koichi
Kawaguchi Kazushi
Fourson George
Fujitsu Limited
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