Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate
Reexamination Certificate
2005-01-25
2005-01-25
Truong, Duc (Department: 1711)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From phenol, phenol ether, or inorganic phenolate
C428S053000, C427S097100, C427S080000
Reexamination Certificate
active
06846899
ABSTRACT:
The present invention relates to poly(arylene ethers) used as low k dielectric layers in electronic applications and articles containing such poly(arylene ethers) comprising the structure:wherein n=5 to 10000 and monovalent Ar1and divalent Ar2are selected from a group of heteroaromatic compounds that incorporate O, N, Se, S, or Te or combinations of the aforesaid elements, including but not limited to:
REFERENCES:
patent: 5658994 (1997-08-01), Burgoyne, Jr. et al.
patent: 5874516 (1999-02-01), Burgoyne, Jr. et al.
patent: 6147009 (2000-11-01), Grill et al.
patent: 6271272 (2001-08-01), Carlier et al.
patent: 6280794 (2001-08-01), Tu et al.
patent: 6303523 (2001-10-01), Cheung et al.
Wang et al; Method of making a slot via filled dual damascene—circuits; May 2002; Advanced micro devices, Inc., Chem Abstract 136: 378486.*
Wang et al; Method of making a via filled dual damascene—fabrication; Apr. 2002; Advanced Micro devices; Chem Abstract 136: 302790.*
F. Cotton et al., “Advanced Inorganic Chemistry” published by Interscience Publishers 1966 p. 896.
Chan Hardy
Chooi Simon
Lim Christopher
Ng Siu Choon
Zhou Mei Sheng
Chartered Semiconductor Manufacturing Ltd.
Pike Rosemary L.S.
Saile George O.
Truong Duc
LandOfFree
Poly(arylene ether) dielectrics does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Poly(arylene ether) dielectrics, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Poly(arylene ether) dielectrics will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3433346