Pollution control system and method of using same

Details Pollution control system and method of using same Pollution control system and method of using same

1991-07-12

1992-10-13

Spitzer, Robert

Gas separation

Means within gas stream for conducting concentrate to collector

55 8, 55 9, 55 20, 55 85, 55 89, 55106, 55122, 55126, 55135, 55218, 55226, 55228, 55258, B01D 4706, B01D 5000, B03C 301

Patent

active

051547341

ABSTRACT:
A pollution control apparatus, which monitors the amount of contaminants being removed from treated gas, and which adjusts parameters to maintain the contaminant removal amount within a preselected, desired range having maximum and minimum limits. A computing microprocessor, causes one or more parameters to be adjusted, thereby increasing or decreasing contaminant removal in order to maintain the level of removal within the preselected range.

REFERENCES:
patent: 3485012 (1969-12-01), Deussner
patent: 3772851 (1973-11-01), Duffey
patent: 3800505 (1974-04-01), Tarves, Jr.
patent: 3917931 (1975-11-01), Sweeney, Jr.
patent: 4152123 (1979-05-01), Hegemann et al.
patent: 4305909 (1981-12-01), Willett et al.
patent: 4322224 (1982-03-01), Roth
patent: 4401444 (1983-08-01), Teller
patent: 4427183 (1984-01-01), Hegemann et al.
patent: 4427420 (1984-01-01), Reid
patent: 4670221 (1987-06-01), Marnet et al.
patent: 4735636 (1988-04-01), Roberts
patent: 4781732 (1988-11-01), Wondrasch et al.
patent: 4844723 (1989-07-01), Tellini et al.
patent: 4964885 (1990-10-01), Wieser-Linhart
patent: 5032154 (1991-07-01), Wright

Affiliated with

Also associated with

Rating

Pollution control system and method of using same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pollution control system and method of using same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pollution control system and method of using same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1297799