Polishing system

Abrading – Precision device or process - or with condition responsive... – With feeding of tool or work holder

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Details

451 41, 451 6, 451288, 451443, 451494, B24B 100

Patent

active

061203491

ABSTRACT:
A polishing system includes a polishing pad for polishing a surface of a layer provided on a substrate, a surface condition measuring device for detecting a condition of a polishing surface of the polishing pad and a controller for controlling a process to the polishing pad by judging whether the polishing pad can be continuously used for polishing of the surface of the layer provided on the substrate, on the basis of a signal indicative of a measurement from the surface condition measuring device.

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patent: 5618447 (1997-04-01), Sandhu
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patent: 5663797 (1997-09-01), Sandhu
patent: 5664987 (1997-09-01), Renteln
patent: 5708506 (1998-01-01), Birang

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