Polishing system

Details Polishing system Polishing system

1999-06-01

2000-09-19

Banks, Derris H.

Abrading

Precision device or process - or with condition responsive...

Computer controlled

451 63, 451 41, 451287, B24B 100

Patent

active

061203483

ABSTRACT:
A polishing method characterized by measuring the thickness of a film of a monitoring piece to be polished which is to be used exclusively for monitoring polishing amount, and obtaining polishing amount on the basis of the results of measurement, and judging, on the basis of the resulting polishing amount, setting/change of polishing condition of a polishing object, whether it is necessary or not to replace a polishing pad, and/or completion of run-in polishing after replacement of the polishing pad, and an apparatus to be used for practicing same.

REFERENCES:
patent: 4407094 (1983-10-01), Bennett et al.
patent: 4910155 (1990-03-01), Cote et al.
patent: 5308438 (1994-05-01), Cote et al.
patent: 5433650 (1995-07-01), Windebarger
patent: 5492594 (1996-02-01), Burke et al.
patent: 5643044 (1997-07-01), Lund
patent: 5664987 (1997-09-01), Renteln
patent: 5672091 (1997-09-01), Takahashi et al.
patent: 5672095 (1997-09-01), Morimoto et al.
patent: 5722875 (1998-03-01), Iwashita et al.

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