Polishing solution supply system, method of supplying...

Details Polishing solution supply system, method of supplying... Polishing solution supply system, method of supplying...

2007-08-21

2007-08-21

Shakeri, Hadi (Department: 3723)

Abrading

Abrading process

Glass or stone abrading

C451S060000, C451S287000, C451S446000

Reexamination Certificate

active

09934474

ABSTRACT:
A first supply unit sprays and supplies abrasive slurry containing abrasive grains into a mixing unit. A second supply unit sprays and supplies additive into the mixing unit. A third supply unit sprays and supplies pure water into the mixing unit. The mixing unit mixes the mist of abrasive slurry, the mist of additive and the mist of pure water to prepare polishing solution, and supplies the polishing solution onto the major surface of a polishing stage.

REFERENCES:
patent: 3979239 (1976-09-01), Walsh
patent: 5478435 (1995-12-01), Murphy et al.
patent: 5643406 (1997-07-01), Shimomura et al.
patent: 5679063 (1997-10-01), Kimura et al.
patent: 5716264 (1998-02-01), Kimura et al.
patent: 5857893 (1999-01-01), Olsen et al.
patent: 5885134 (1999-03-01), Shibata et al.
patent: 5997392 (1999-12-01), Chamberlin et al.
patent: 6048256 (2000-04-01), Obeng et al.
patent: 6059920 (2000-05-01), Nojo et al.
patent: 6123602 (2000-09-01), Rodriguez et al.
patent: 6241581 (2001-06-01), Miyashita et al.
patent: 6283835 (2001-09-01), Harada et al.
patent: 6293849 (2001-09-01), Kawashima
patent: 9-148286 (1997-06-01), None
patent: 9-199455 (1997-07-01), None
patent: 10-202525 (1998-08-01), None
patent: 2000-117636 (2000-04-01), None

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