Polishing slurry, production method of glass substrate for...

Details Polishing slurry, production method of glass substrate for... Polishing slurry, production method of glass substrate for...

2005-08-29

2011-10-04

Norton, Nadine G (Department: 1713)

Etching a substrate: processes

Planarizing a nonplanar surface

C216S083000, C216S089000, C438S691000

Reexamination Certificate

active

08029687

ABSTRACT:
The present invention provides a low-cost polishing slurry having excellent effect with respect to defects and smoothness of the surface to be polished. The polishing slurry comprises a silica abrasive and a ceria abrasive, wherein the silica abrasive content is less than 3 mass % and the ceria abrasive content is less than 1 mass %, based on the entire polishing slurry. Further, the present invention provides a method for producing a crystallized glass substrate for an information recording medium, wherein the method use a polishing slurry of the present invention. Furthermore, the present invention provides a method for producing an information recording medium, comprising forming a recording layer on a crystallized glass substrate for an information recording medium obtained by the present method.

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