Abrading – Machine – Endless band tool
Reexamination Certificate
2005-12-06
2005-12-06
Nguyen, George (Department: 3723)
Abrading
Machine
Endless band tool
C451S533000, C451S536000
Reexamination Certificate
active
06971950
ABSTRACT:
An endless belt for a belt type polishing machine comprises a support fabric and a polymer layer of relatively low hardness. The polymer layer is formed with drainage grooves. The support fabric may comprise a non woven or woven material, or a membrane with oriented reinforcing yarns. A further version comprises a spiral-link fabric supporting a woven or non woven layer carrying the polymer layer. The polymer layer may be a double layer, the upper of which is either harder or softer than the lower layer.
REFERENCES:
patent: 27817 (1860-04-01), Mayall
patent: 81986 (1868-09-01), Crane
patent: 4109543 (1978-08-01), Foti
patent: 4282011 (1981-08-01), Terpay
patent: 4396657 (1983-08-01), Ibrahim
patent: 4437269 (1984-03-01), Shaw
patent: 4478610 (1984-10-01), Parekh et al.
patent: 4520059 (1985-05-01), Worrall et al.
patent: 4576612 (1986-03-01), Shukla et al.
patent: 4649074 (1987-03-01), Borel
patent: 4728552 (1988-03-01), Jensen, Jr.
patent: 4753838 (1988-06-01), Kimura et al.
patent: 4796749 (1989-01-01), Lefferts
patent: 4927432 (1990-05-01), Budinger et al.
patent: 4954141 (1990-09-01), Takiyama et al.
patent: 4962562 (1990-10-01), Englund et al.
patent: 5020283 (1991-06-01), Tuttle
patent: 5164241 (1992-11-01), De La Porte et al.
patent: 5177908 (1993-01-01), Tuttle
patent: 5197999 (1993-03-01), Thomas
patent: 5212910 (1993-05-01), Breivogel et al.
patent: 5234867 (1993-08-01), Schultz et al.
patent: 5257478 (1993-11-01), Hyde et al.
patent: 5287663 (1994-02-01), Pierce et al.
patent: 5329734 (1994-07-01), Yu
patent: 5454750 (1995-10-01), Cosmano et al.
patent: 5482756 (1996-01-01), Berger et al.
patent: 5487697 (1996-01-01), Jensen
patent: 5489233 (1996-02-01), Cook et al.
patent: 5514456 (1996-05-01), Lefferts
patent: 5534106 (1996-07-01), Cote et al.
patent: 5558568 (1996-09-01), Talieh et al.
patent: 5573619 (1996-11-01), Benedict et al.
patent: 5573844 (1996-11-01), Donovan et al.
patent: 5575707 (1996-11-01), Talieh et al.
patent: 5578362 (1996-11-01), Reinhardt et al.
patent: 5605760 (1997-02-01), Roberts
patent: 5692947 (1997-12-01), Talieh et al.
patent: 5735731 (1998-04-01), Lee
patent: 5924917 (1999-07-01), Benedict et al.
patent: 6328642 (2001-12-01), Pant et al.
patent: 6406576 (2002-06-01), Benedict et al.
patent: 6406577 (2002-06-01), Benedict et al.
patent: 6736714 (2004-05-01), Dudovicz
patent: 696495 (1999-10-01), None
patent: 63267155 (1988-11-01), None
patent: 9616436 (1996-05-01), None
patent: 9835785 (1998-08-01), None
patent: 9835786 (1998-08-01), None
patent: 9836442 (1998-08-01), None
Fynn et al., “The Cutting and Polishing of Electro-optic Materials” (John Wiley and Sons, 1979) pp 82-83.
Nguyen George
Praxair Technology Inc.
Schwartz Iurie A.
LandOfFree
Polishing silicon wafers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polishing silicon wafers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polishing silicon wafers will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3493899