Polishing sheet material and method for its production

Stock material or miscellaneous articles – Pile or nap type surface or component – Nap type surface

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Details

156153, 156154, 156246, 156249, 156289, 428160, 4283171, 4283197, 428409, B32B 3300

Patent

active

047538384

ABSTRACT:
A process and product by process of making a polishing sheet material especially useful in the polishing of silicon wafer is disclosed. There is known a process of producing a poromeric suede-like polyurethane layer which comprises applying a solution of polyurethane on an impermeable synthetic resin film, subjecting the polyurethane layer to wet coagulation to form a honeycomb-like cellular structure of polyurethane on the synthetic resin film, removing the synthetic resin film from the cellular polyurethane layer, and abrading a thin surface skin of the cellular layer to form the poromeric suede-like polyurethane layer. In the present invention, a supporting layer made of a non-poromeric, soft synthetic resin sheet having good flatness is joined to a reverse side of the suede-like polyurethane layer to form a polishing sheet material.

REFERENCES:
patent: 2896304 (1959-07-01), Peroni
patent: 3284274 (1966-11-01), Hulslander et al.
patent: 3524791 (1970-08-01), Bethman et al.
patent: 3577507 (1971-05-01), Corbett
patent: 3719549 (1973-03-01), Mittman
patent: 3876491 (1975-04-01), Martel
patent: 3914492 (1975-10-01), Wisotzky et al.

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