Polishing plate

Details Polishing plate Polishing plate

2005-03-01

2005-03-01

Wilson, Lee D. (Department: 3723)

Abrading

Rigid tool

C451S041000

Reexamination Certificate

active

06860803

ABSTRACT:
There is disclosed a polishing plate for polishing a workpiece by rubbing the workpiece to be processed with the polishing plate, comprising at least a substrate and a polishing material, the polishing material being a vapor phase synthetic polycrystalline diamond film deposited on a surface of the substrate to rub the workpiece to be processed. The present invention provides a polishing plate of which production cost is low and which can effectively polish a surface of a workpiece to be processed comprising a very hard material such as DLC, SiC, SiN, Si or the like and extremely smooth the surface.

REFERENCES:
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patent: 6193585 (2001-02-01), Tanabe et al.
patent: 6428399 (2002-08-01), Tanabe et al.
patent: 6439986 (2002-08-01), Myoung et al.
patent: 6592436 (2003-07-01), Abe et al.
patent: 20020039831 (2002-04-01), Usuda
patent: 0078504 (2000-12-01), None

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