Abrading – Abrading process – Glass or stone abrading
Reexamination Certificate
2005-05-10
2005-05-10
Hail, III, Joseph J. (Department: 3723)
Abrading
Abrading process
Glass or stone abrading
C451S042000, C451S287000, C451S296000, C051S294000, C051S302000
Reexamination Certificate
active
06890244
ABSTRACT:
A polishing pad for polishing semiconductors and other planar substrates in the presence of a slurry comprising abrasive particles and a dispersive agent is disclosed. The polishing pad includes a soluble component within a polymer matrix component. The soluble component includes particles soluble in the slurry sufficiently to provide a void structure in the polishing surface of the pad. The void structure enhances the polishing rate and uniformity by increasing the mobility of the abrasive particles while reducing scratching of the polished surface. Additives that further enhance polishing and/or assist in the removal of residues generated during polishing, such as surfactants and removers, are optionally incorporated in the soluble particles or topographically coated on the soluble particles.
REFERENCES:
patent: 3607159 (1971-09-01), Haywood
patent: 4255164 (1981-03-01), Butzke et al.
patent: 5310455 (1994-05-01), Pasch et al.
patent: 5346516 (1994-09-01), Alkhas et al.
patent: 5578098 (1996-11-01), Gagliardi et al.
patent: 5578362 (1996-11-01), Reinhardt et al.
patent: 5624304 (1997-04-01), Pasch et al.
patent: 5632668 (1997-05-01), Lindholm et al.
patent: 5645736 (1997-07-01), Allman
patent: 5702292 (1997-12-01), Brunelli et al.
patent: 5725417 (1998-03-01), Robinson
patent: 5879226 (1999-03-01), Robinson
patent: 5910471 (1999-06-01), Christianson et al.
patent: 5976000 (1999-11-01), Hudson
patent: 6254460 (2001-07-01), Walker et al.
patent: 6602111 (2003-08-01), Fujie et al.
patent: 0 239 040 (1987-09-01), None
patent: 0 845 328 (1998-06-01), None
patent: 2-88165 (1990-03-01), None
patent: 02 088165 (1990-03-01), None
patent: 02088165 (1990-03-01), None
patent: 8-500622 (1996-01-01), None
patent: 09059395 (1997-03-01), None
patent: 10 199839 (1998-07-01), None
patent: 10225864 (1998-08-01), None
patent: WO 9404599 (1994-03-01), None
Billings Scott C.
Gilbride David S.
Hsu Oscar K.
Vangsness Jean K.
Freudenberg Nonwovens Limited Partnership
Grossman Tucker Perreault & Pfleger
Hail III Joseph J.
Ojini Anthony
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