Polishing pads and methods relating thereto

Abrading – Rigid tool – Rotary disk

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Details

451 41, 51298, B24B 100

Patent

active

060222689

ABSTRACT:
This invention describes improved polishing pads useful in the manufacture of semiconductor devices or the like. The pads of the present invention have an advantageous hydrophilic polishing material and have an innovative surface topography and texture which generally improves predictability and polishing performance.

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patent: 5394655 (1995-03-01), Allen et al.
patent: 5489233 (1996-02-01), Cook et al.
patent: 5569062 (1996-10-01), Karlsrud

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