Abrading – Precision device or process - or with condition responsive... – By optical sensor
Reexamination Certificate
2007-03-27
2007-03-27
Ackun, Jr., Jacob K. (Department: 3723)
Abrading
Precision device or process - or with condition responsive...
By optical sensor
C451S527000, C451S533000
Reexamination Certificate
active
10666797
ABSTRACT:
The invention provides a polishing pad for chemical-mechanical polishing comprising (a) a first polishing layer comprising a polishing surface and a first aperture having a first length and first width, (b) a second layer comprising a body and a second aperture having a second length and second width, wherein the second layer is substantially coextensive with the first polishing layer and at least one of the first length and first width is smaller than the second length and second width, and (c) a substantially transparent window portion, wherein the transparent window portion is disposed within the second aperture of the second layer so as to be aligned with the first aperture of the first polishing layer and the transparent window portion is separated from the body of the second layer by a gap. The invention further provides a chemical-mechanical polishing apparatus and method of polishing a workpiece.
REFERENCES:
patent: 5433651 (1995-07-01), Lustig et al.
patent: 5605760 (1997-02-01), Roberts
patent: 6000996 (1999-12-01), Fujiwara
patent: 6146242 (2000-11-01), Treur et al.
patent: 6171181 (2001-01-01), Budinger et al.
patent: 6248000 (2001-06-01), Aiyer
patent: 6254459 (2001-07-01), Bajaj et al.
patent: 6280290 (2001-08-01), Birang et al.
patent: 6358130 (2002-03-01), Freeman et al.
patent: 6454630 (2002-09-01), Tolles
patent: 6458014 (2002-10-01), Ishikawa et al.
patent: 6517417 (2003-02-01), Roberts et al.
patent: 6524164 (2003-02-01), Tolles
patent: 6524176 (2003-02-01), Cheng et al.
patent: 6599765 (2003-07-01), Boyd et al.
patent: 6641470 (2003-11-01), Zhao et al.
patent: 6676483 (2004-01-01), Roberts
patent: 6806100 (2004-10-01), Xu et al.
patent: 2001/0053658 (2001-12-01), Budinger et al.
patent: 2002/0127951 (2002-09-01), Ishikawa et al.
patent: 2002/0137431 (2002-09-01), Labunsky et al.
patent: 1 293 297 (2003-03-01), None
patent: 11-77517 (1997-09-01), None
patent: WO 01/94074 (2001-12-01), None
patent: WO 02/078902 (2002-10-01), None
Beeler Jeffrey L.
Newell Kelly J.
Turner Kyle A.
Ackun Jr. Jacob K.
Borg-Breen Caryn
Cabot Microelectronics Coporation
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